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Pulsed laser deposition

"Pulsed laser deposition (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer facing the target). This process can occur in ultra high vacuum or in the presence of a background gas, such as oxygen which is commonly used when depositing oxides to fully oxygenate the deposited films."

http://en.wikipedia.org/wiki/Pulsed_laser_deposition

SURFACE systems+technology GmbH & Co. KG offers a wide range of Pulsed Laser Deposition (PLD) and Ultra-High Vacuum (UHV) systems and components. The PLD Workstation is our compact and versatile all-in-one PLD system. This tool is perfectly suited if just a PLD system is required, without the need for vacuum sample transfer or additional deposition and analysis methods.

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Ablation flux.

PLD chamber.